golang-github-openprinting-ipp-usb

Direct Vulnerabilities

Known vulnerabilities in the golang-github-openprinting-ipp-usb package. This does not include vulnerabilities belonging to this package’s dependencies.

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VulnerabilityVulnerable Version
  • M
Allocation of Resources Without Limits or Throttling

*
  • M
Allocation of Resources Without Limits or Throttling

*
  • M
HTTP Request Smuggling

*
  • M
Improper Input Validation

*
  • M
Misinterpretation of Input

*
  • M
Allocation of Resources Without Limits or Throttling

*
  • M
Race Condition

*
  • M
HTTP Request Smuggling

*
  • M
HTTP Request Smuggling

*
  • M
Information Exposure

*
  • M
Excessive Platform Resource Consumption within a Loop

<0:0.9.27-7.el10_2.1
  • M
Improper Output Neutralization for Logs

*
  • H
Improper Validation of Unsafe Equivalence in Input

*
  • M
Time-of-check Time-of-use (TOCTOU)

<0:0.9.27-3.el10_0.4
  • H
Multiple Locks of a Critical Resource

<0:0.9.27-3.el10_0.4
  • H
Allocation of Resources Without Limits or Throttling

<0:0.9.27-3.el10_0.4
  • M
HTTP Request Smuggling

*
  • H
Improper Validation of Syntactic Correctness of Input

<0:0.9.27-3.el10_0.3
  • H
Improper Validation of Syntactic Correctness of Input

<0:0.9.27-5.el10_1.1
  • M
Improper Output Neutralization for Logs

*
  • M
Expected Behavior Violation

*
  • M
Creation of Immutable Text Using String Concatenation

*
  • M
Improper Certificate Validation

*
  • M
Allocation of Resources Without Limits or Throttling

*
  • M
Allocation of Resources Without Limits or Throttling

*
  • H
Allocation of Resources Without Limits or Throttling

<0:0.9.27-3.el10_0.2
  • M
Improper Certificate Validation

<0:0.9.27-3.el10_0.2
  • H
Excessive Platform Resource Consumption within a Loop

<0:0.9.27-3.el10_0.1
  • M
Time-of-check Time-of-use (TOCTOU)

*
  • M
Information Exposure

*
  • M
HTTP Request Smuggling

<0:0.9.27-3.el10_0
  • L
Improper Verification of Cryptographic Signature

*
  • M
Improper Input Validation

*
  • M
Information Exposure

*
  • M
Information Exposure

*